PHOTORESPONSE AND INTERFERENCE IN NB2O5 DIODES

被引：9

作者：

HICKMOTT, TW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1966年 / 37卷 / 12期

关键词：

D O I：

10.1063/1.1708092

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4588 / &

共 11 条

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CHOPRA, KL .

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[2] AVALANCHE-INDUCED NEGATIVE RESISTANCE IN THIN OXIDE FILMS [J].

CHOPRA, KL .

JOURNAL OF APPLIED PHYSICS, 1965, 36 (01) :184-&

[3]

CUONG ND, 1966, J APPL PHYS, V37, P1660

[4] BISTABLE SWITCHING IN NIOBIUM OXIDE DIODES [J].

HIATT, WR ;

HICKMOTT, TW .

APPLIED PHYSICS LETTERS, 1965, 6 (06) :106-&

[5] ELECTROLUMINESCENCE AND CONDUCTION IN NB-NB2O5-AU DIODES [J].

HICKMOTT, TW .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (12) :4380-&

[6] THE COLOUR OF THIN OXIDE FILMS ON METALS [J].

MACSWAN, AM .

PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1958, 72 (467) :742-748

[7]

RAMO S, 1953, FIELDS WAVES MODERN, P286

[8] PHOTOGALVANIC EFFECTS WITH ANODIZED ZIRCONIUM AND NIOBIUM ELECTRODES [J].

SALOMON, RE ;

ADAMS, GB ;

GRAVEN, WM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (11) :1163-1165

[9] SPECTRAL RESPONSE OF SHORT-CIRCUIT PHOTOCURRENT IN ANODIZED NIOBIUM ELECTRODES [J].

SCHELL, RA ;

SALOMON, RE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (01) :24-&

[10] PHOTOCURRENTS THROUGH THIN FILMS OF AL2O3 [J].

SHEPARD, KW .

JOURNAL OF APPLIED PHYSICS, 1965, 36 (3P1) :796-&

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