CALIBRATION OF ARGON ION SPUTTER RATES USING NUCLEAR MICROANALYSIS AND AUGER-SPECTROSCOPY

被引：31

作者：

TAPPING, RL

DAVIDSON, RD

JACKMAN, TE

机构：

[1] AECL, Chalk River, Ont, Can, AECL, Chalk River, Ont, Can

来源：

SURFACE AND INTERFACE ANALYSIS | 1985年 / 7卷 / 02期

关键词：

D O I：

10.1002/sia.740070209

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：105 / 108

页数：4

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