ANODIC-OXIDATION OF TANTALUM SILICIDE

被引：6

作者：

MARTINEZDUART, JM

FERNANDEZ, M

PAULE, E

CLIMENT, A

ALBELLA, JM

PERRIERE, J

SIEJKA, J

机构：

[1] UNIV AUTONOMA MADRID,INST FIS ESTADO SOLIDO,E-28049 MADRID,SPAIN

[2] UNIV PARIS 07,ECOLE NORMALE SUPER,PHYS SOLIDES GRP,F-75221 PARIS,FRANCE

来源：

APPLIED PHYSICS LETTERS | 1985年 / 47卷 / 06期

关键词：

D O I：

10.1063/1.96077

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：579 / 581

页数：3

共 19 条

[1] ELECTRON INJECTION AND AVALANCHE DURING THE ANODIC-OXIDATION OF TANTALUM [J].

ALBELLA, JM ;

MONTERO, I ;

MARTINEZDUART, JM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (05) :1101-1104

[2] 7ICROANALYSIS BY DIRECT OBSERVATION OF NUCLEAR REACTIONS USING A 2 MEV VAN-DE-GRAAFF [J].

AMSEL, G ;

NADAI, JP ;

DARTEMAR.E ;

DAVID, D ;

GIRARD, E ;

MOULIN, J .

NUCLEAR INSTRUMENTS & METHODS, 1971, 92 (04) :481-&

[3] INTERFACE EFFECTS IN THE FORMATION OF SILICON-OXIDE ON METAL SILICIDE LAYERS OVER SILICON SUBSTRATES [J].

BAGLIN, JEE ;

DHEURLE, FM ;

PETERSSON, CS .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (04) :1849-1854

[4] REPEATED REMOVAL OF THIN-LAYERS OF SILICON BY ANODIC-OXIDATION [J].

BARBER, HD ;

LO, HB ;

JONES, JE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (09) :1404-1408

[5] THERMAL-OXIDATION OF NICKEL DISILICIDE [J].

BARTUR, M ;

NICOLET, MA .

APPLIED PHYSICS LETTERS, 1982, 40 (02) :175-177

[6] THERMAL-OXIDATION OF TRANSITION-METAL SILICIDES ON SI - SUMMARY [J].

BARTUR, M ;

NICOLET, MA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (02) :371-375

[7] REFRACTORY-METAL SILICIDES - THIN-FILM PROPERTIES AND PROCESSING TECHNOLOGY [J].

CHOW, TP ;

STECKL, AJ .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (11) :1480-1497

[8] CHARACTERISTICS OF TASI2/POLY-SI FILMS OXIDIZED IN STEAM FOR VLSI APPLICATIONS [J].

DEBLASI, JM ;

RAZOUK, RR ;

THOMAS, ME .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (12) :2478-2482

[9] ELECTRICAL-PROPERTIES OF CO-SPUTTERED TANTALUM SILICIDES [J].

DENIS, J ;

FERNANDEZ, M ;

GONZALEZ, JP ;

ALBELLA, JM ;

MARTINEZDUART, JM .

THIN SOLID FILMS, 1985, 125 (3-4) :329-333

[10] OXIDATION OF SILICIDE THIN-FILMS - TISI2 [J].

DHEURLE, F ;

IRENE, EA ;

TING, CY .

APPLIED PHYSICS LETTERS, 1983, 42 (04) :361-363

← 1 2 →