A STUDY OF PROJECTED OPTICAL-IMAGES FOR TYPICAL IC MASK PATTERNS ILLUMINATED BY PARTIALLY COHERENT-LIGHT

被引：19

作者：

LIU, AC ^{[1
]}

LIN, BJ ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

关键词：

D O I：

10.1109/T-ED.1983.21283

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1251 / 1263

页数：13

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