LOW-TEMPERATURE PHASE-SEPARATION IN CESI1.86

被引:17
作者
MADAR, R
HOUSSAY, E
ROUAULT, A
SENATEUR, JP
LAMBERT, B
DANTERROCHES, CM
PIERRE, J
LABORDE, O
SOUBEYROUX, JL
PELISSIER, J
机构
[1] CNRS,CRISTALLOG LAB,F-38402 GRENOBLE,FRANCE
[2] CTR NATL ETUD TELECOMMUN,CNS,F-38243 MEYLAN,FRANCE
[3] CNRS,LOUIS NEEL LAB,F-38402 GRENOBLE,FRANCE
[4] CNRS,CTR RECH TRES BASSES TEMP,F-38042 GRENOBLE,FRANCE
[5] INST MAX VON LAUE PAUL LANGEVIN,F-38042 GRENOBLE,FRANCE
[6] CTR ETUDES NUCL GRENOBLE,F-38041 GRENOBLE,FRANCE
关键词
D O I
10.1557/JMR.1990.2126
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Samples of CeSi1.86 which exhibit Kondo behavior are shown by neutron powder diffraction and transmission electron microscopy to consist of two closely related tetragonal phases. The primary phase is of the ThSi2 structure type with some vacancies in the silicon sublattice. The second phase presents an ordering of these vacancies. These two phases coexist at low temperature, but the abundance of the second phase increases with decreasing temperature. Neutron diffraction measurements and TEM experiments show that the phase separation occurs reversibly around 260 K, in close relation with an anomaly in the transport properties. The presence of a hysteresis indicates that we are dealing with a first order transition. © 1990, Materials Research Society. All rights reserved.
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收藏
页码:2126 / 2131
页数:6
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