ULTRAPURE SIO2 AND AL2O3 FOR PREPARATION OF LOW-LOSS COMPOUND GLASSES

被引：16

作者：

GOSSINK, RG ^{[1
]}

COENEN, HAM ^{[1
]}

ENGELFRIET, AR ^{[1
]}

VERHEIJKE, ML ^{[1
]}

VERPLANKE, JC ^{[1
]}

机构：

[1] PHILIPS RES LABS,EINDHOVEN,NETHERLANDS

来源：

关键词：

D O I：

10.1016/0025-5408(75)90144-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：35 / 40

页数：6

共 9 条

[1]

AKERMAN K, 1961, WISS TECH INT S, V1, P131

[2]

BAGLEY BG, 1973, B AM CERAM SOC, V52, P701

[3]

BAILAR JC, 1973, COMPREHENSIVE INORGA, V1, P1426

[4]

DAGLISH HN, 1970, GLASS TECHNOL, V11, P30

[5]

IKEDA Y, 1974, 10 INT C GLASS KYOT

[6]

Newns G. R., 1973, Opto-Electronics, V5, P289, DOI 10.1007/BF02057128

[7] LOW-LOSS GLASS FOR OPTICAL TRANSMISSION [J].

NEWNS, GR ;

BEALES, KJ ;

DUNCAN, WJ .

[8] OPTICAL-ABSORPTION OF TRANSITION-ELEMENTS IN VITREOUS SILICA [J].

SCHULTZ, PC .

VERHEIJKE, ML ;

VERPLANK.JC .

JOURNAL OF RADIOANALYTICAL CHEMISTRY, 1973, 15 (02) :509-515