NEW ANALYSIS FOR THE ASSIGNMENT OF UV-VISIBLE IONIC XE LASER LINES

被引：9

作者：

DUCHOWICZ, R

SCHINCA, D

GALLARDO, M

机构：

[1] Centro de Investigaciones Opticas

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1994年 / 30卷 / 01期

关键词：

D O I：

10.1109/3.272074

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Visible and UV laser emissions from a highly ionized pulsed Xe plasma were studied in relation to the ionic assignment of the laser lines. Time-resolved spectroscopy and intensity versus pressure analysis were used to determine the ionic origin of the studied lines. The results of both methods show good agreement, and the joint coincidence is used as a criterion for ionic classification, thus imposing a stringent condition for the assignment of the lines and enhancing its reliability. The disagreement between some of our assignments and those from other authors are discussed on the basis of the results of our systematic analysis of more than 200 spontaneous lines in the region of interest.

引用

页码：155 / 159

页数：5

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