STRUCTURE AND DYNAMICS OF A MAGNETRON DC ARC PLASMA

被引:25
作者
SLINKMAN, D [1 ]
SACKS, R [1 ]
机构
[1] UNIV MICHIGAN, DEPT CHEM, ANN ARBOR, MI 48109 USA
关键词
DC Arc Plasma - Plasma/Magnetic Field Interaction - Rotating Arc;
D O I
10.1366/0003702904085787
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A direct-current arc plasma generator is described which uses a concentric electrode configuration and a magnetic field parallel to the electrode axis to obtain rotation of the arc current channel at a frequency in the 1-3 kHz range. The anode is a hollow graphite cylinder, and the cathode is a thoriated tungsten wire. A magnetic field of several hundred gauss is obtained from one or more ring-shaped permanent ceramic magnets. For a 5-mm anode diameter, the plasma is diffuse, and the current channel has the form of a thin radial sheet which undergoes relatively small periodic perturbations at the rotational frequency. Design features, performance data, and plasma structure are considered.
引用
收藏
页码:76 / 83
页数:8
相关论文
共 23 条
[1]   STUDY OF A DC ARC IN AN ALTERNATING MAGNETIC-FIELD [J].
BELCHEV, S ;
GEORGIEVA, P .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1980, 35 (06) :367-371
[2]   FAST DEPOSITION OF METALLURGICAL COATINGS AND PRODUCTION OF SURFACE ALLOYS USING A PULSED HIGH-CURRENT VACUUM-ARC [J].
BOXMAN, RL ;
GOLDSMITH, S ;
SHALEV, S ;
YALOZ, H ;
BROSH, N .
THIN SOLID FILMS, 1986, 139 (01) :41-52
[3]  
BUCKLEY BT, 1987, 14 FACSS DETR
[4]  
CHEN FF, 1984, INTRO PLASMA PHYSICS, V1
[5]   CHARACTERIZATION OF AN IMPROVED DC PLASMA EXCITATION SOURCE [J].
COLEMAN, GN ;
BRAUN, WP ;
ALLEN, AM .
APPLIED SPECTROSCOPY, 1980, 34 (01) :24-30
[6]  
DORONOV AM, 1982, J APPL MECH TECH PHY, V22, P28
[7]   VACUUM PLASMA SPRAY QUALITY-CONTROL [J].
GRUNER, H .
THIN SOLID FILMS, 1984, 118 (04) :409-420
[8]  
HERMAN H, 1988, MRS B DEC, P60
[9]  
HORSPOOL WM, 1976, ASPECTS ORGANIC PHOT, pCH2
[10]   DC PLASMA ARCS FOR ELEMENTAL ANALYSIS [J].
KEIRS, CD ;
VICKERS, TJ .
APPLIED SPECTROSCOPY, 1977, 31 (04) :273-283