ELECTRON-BEAM-CONTROLLED DISCHARGE PUMPING OF KRF LASER

被引：101

作者：

MANGANO, JA ^{[1
]}

JACOB, JH ^{[1
]}

机构：

[1] AVCO EVERETT RES LAB,EVERETT,MA 02149

来源：

关键词：

D O I：

10.1063/1.88547

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：495 / 498

页数：4

共 10 条

[1] 354-NM LASER ACTION ON XEF
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EWING, JJ
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[2] BRAU CA, TO BE PUBLISHED
[3] CALVERT JG, 1966, PHOTOCHEMISTRY, P184
[4] EWING J, COMMUNICATION
[5] EMISSION-SPECTRUM OF XEI IN ELECTRON-BEAM-EXCITED XE-I2 MIXTURES
EWING, JJ
BRAU, CA
[J]. PHYSICAL REVIEW A, 1975, 12 (01): : 129 - 132
[6] LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL
EWING, JJ
BRAU, CA
[J]. APPLIED PHYSICS LETTERS, 1975, 27 (06) : 350 - 352
[7] HILL RM, 1974, MP7439 STANF RES I R
[8] MANGANO JA, UNPUBLISHED
[9] STIMULATED EMISSION AT 281.8 NM FROM XEBR
SEARLES, SK
HART, GA
[J]. APPLIED PHYSICS LETTERS, 1975, 27 (04) : 243 - 245
[10] BOUND-FREE EMISSION-SPECTRA OF DIATOMIC XENON HALIDES
VELAZCO, JE
SETSER, DW
[J]. JOURNAL OF CHEMICAL PHYSICS, 1975, 62 (05) : 1990 - 1991