INTERFACE BEHAVIOR EVALUATION IN AU-CR, AU-TI AND AU-PD-TI THIN-FILMS BY MEANS OF RESISTIVITY AND STYLUS MEASUREMENTS

被引：20

作者：

AUDINO, R ^{[1
]}

DESTEFANIS, G ^{[1
]}

GORGELLINO, F ^{[1
]}

POLLINO, E ^{[1
]}

TAMAGNO, S ^{[1
]}

机构：

[1] CTR STUDI & LAB TELECOMUN,I-10148 TORINO,ITALY

来源：

关键词：

D O I：

10.1016/0040-6090(76)90028-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：343 / 347

页数：5

共 4 条

BASSECHES, H .

PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1971, 59 (10) :1468-+

[2] TERMINATION MATERIALS FOR THIN FILM RESISTORS [J].

FISHER, JS ;

HALL, PM .

PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1971, 59 (10) :1418-&

SPEIGHT, JD ;

BILL, MJ .

[4] METALLIZATION SYSTEMS FOR SILICON INTEGRATED CIRCUITS [J].

TERRY, LE ;

WILSON, RW .