EFFECT OF ADDITIVES ON IRRADIATION BEHAVIOR OF UO2

被引：38

作者：

KILLEEN, JC ^{[1
]}

机构：

[1] BERKELEY NUCL LABS,CENT ELECT GENERATING BOARD,BERKELEY,GLOUCESTERSHIRE,ENGLAND

来源：

JOURNAL OF NUCLEAR MATERIALS | 1975年 / 58卷 / 01期

关键词：

D O I：

10.1016/0022-3115(75)90164-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：39 / 46

页数：8

共 14 条

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[9] EFFECT OF STOICHIOMETRY ON DIFFUSION OF XENON IN UO2 [J].

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[10]

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