CHARACTERIZATION OF SI/SIO2 INTERFACE DEFECTS BY ELECTRON-SPIN RESONANCE

被引:165
作者
POINDEXTER, EH
CAPLAN, PJ
机构
关键词
D O I
10.1016/0079-6816(83)90006-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:201 / 294
页数:94
相关论文
共 81 条
  • [1] ALGER RS, 1968, ELECTRON PARAMAGNETI, P316
  • [2] BARTON RW, 1980, PHYSICS MOS INSULATO, P316
  • [3] BENDIK NT, 1971, SOV PHYS SEMICOND+, V5, P749
  • [4] Biegelsen D. K., 1981, Nuclear and Electron Resonance Spectroscopies Applied to Materials Science. Proceedings of the Symposium, P85
  • [5] DEFECTS AND IMPURITIES IN THERMAL OXIDES ON SILICON
    BROWER, KL
    LENAHAN, PM
    DRESSENDORFER, PV
    [J]. APPLIED PHYSICS LETTERS, 1982, 41 (03) : 251 - 253
  • [6] ELECTRON PARAMAGNETIC RESONANCE OF NEUTRAL (S=1) ONE-VACANCY-OXYGEN CENTER IN IRRADIATED SILICON
    BROWER, KL
    [J]. PHYSICAL REVIEW B, 1971, 4 (06): : 1968 - &
  • [7] ELECTRON-SPIN-RESONANCE STUDIES OF THERMALLY OXIDIZED SILICON-WAFERS
    BRUNSTROM, C
    SVENSSON, C
    [J]. SOLID STATE COMMUNICATIONS, 1981, 37 (05) : 399 - 404
  • [8] ESR CENTERS, INTERFACE STATES, AND OXIDE FIXED CHARGE IN THERMALLY OXIDIZED SILICON WAFERS
    CAPLAN, PJ
    POINDEXTER, EH
    DEAL, BE
    RAZOUK, RR
    [J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (09) : 5847 - 5854
  • [9] PARAMAGNETIC DEFECTS IN SILICON-SILICON DIOXIDE SYSTEMS
    CAPLAN, PJ
    HELBERT, JN
    WAGNER, BE
    POINDEXTER, EH
    [J]. SURFACE SCIENCE, 1976, 54 (01) : 33 - 42
  • [10] ULTRAVIOLET BLEACHING AND REGENERATION OF SI=SI3 CENTERS AT THE SI/SIO2 INTERFACE OF THINLY OXIDIZED SILICON-WAFERS
    CAPLAN, PJ
    POINDEXTER, EH
    MORRISON, SR
    [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (01) : 541 - 545