LARGE-AREA ZNO THIN-FILMS FOR SOLAR-CELLS PREPARED BY PHOTOINDUCED METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引:29
作者
YOSHINO, M [1 ]
WENAS, WW [1 ]
YAMADA, A [1 ]
KONAGAI, M [1 ]
TAKAHASHI, K [1 ]
机构
[1] TOKYO INST TECHNOL,DEPT ELECT & ELECTR ENGN,MEGURO KU,TOKYO 152,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 02期
关键词
PHOTO-MOCVD; TEXTURED ZNO; SOLAR CELLS;
D O I
10.1143/JJAP.32.726
中图分类号
O59 [应用物理学];
学科分类号
摘要
Textured ZnO films with low resistivity and high transparency in a wide wavelength range from 400 nm to 1400 nm have been successfully grown by the photo-induced metalorganic chemical vapor deposition (MOCVD) technique. It was found that ultraviolet irradiation during deposition was very effective in improving the electrical properties of the films, even with a low intensity. The obtained films have a good uniformity along the 10 X 10 CM2 substrate.
引用
收藏
页码:726 / 730
页数:5
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