DOES PREFERENTIAL SPUTTERING DEPEND ON THE ANGLE OF INCIDENCE

被引：13

作者：

BARETZKY, B

TAGLAUER, E

机构：

来源：

SURFACE SCIENCE | 1985年 / 162卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(85)91012-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：996 / 1002

页数：7

共 17 条

[1]

ANDERSEN HH, 1984, ION IMPLANTATION BEA, P128

[2]

BARETZKY B, 1985, THESIS LUDWIGMAXIMIL

[3] SPUTTERING MECHANISM FOR LOW-ENERGY LIGHT-IONS [J].

BEHRISCH, R ;

MADERLECHNER, G ;

SCHERZER, BMU ;

ROBINSON, MT .

APPLIED PHYSICS, 1979, 18 (04) :391-398

[4]

Betz G., 1983, SPUTTERING PARTICLE, P11

[5] AN XPS STUDY OF THE ANGULAR-DEPENDENCE OF PREFERENTIAL SPUTTERING AND ION-INDUCED REDUCTION IN LEAD-OXIDE CONTAINING GLASSES [J].

CHRISTIE, AB ;

SUTHERLAND, I ;

WALLS, JM .

VACUUM, 1984, 34 (06) :659-662

[6] COMPUTER-SIMULATION OF PREFERENTIAL SPUTTERING [J].

ECKSTEIN, W ;

MOLLER, W .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) :727-734

[7]

ECKSTEIN W, 1984, NUCLEAR FUSION

[8]

ECKSTEIN W, 1985, APPL PHYS A, V37, P1

[9]

KELLY R, 1984, CHEM PHYSICS SOLID S, V5, P159

[10]

OEN OS, 1976, NUCL INSTRUM METHODS, V132, P647, DOI 10.1016/0029-554X(76)90806-5

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