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THERMAL-STABILITY OF MAGNETOOPTIC QUADRILAYERS

被引：44
作者：
ANTHONY, TC
BRUG, J
NABERHUIS, S
BIRECKI, H
机构：
[1] Hewlett-Packard Lab, Palo Alto, CA,, USA, Hewlett-Packard Lab, Palo Alto, CA, USA
来源：
JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 01期
关键词：
DIELECTRIC MATERIALS - Thin Films - HEAT TREATMENT - Annealing - MAGNETIC MATERIALS - Amorphous - RELAXATION PROCESSES - Measurements - TERBIUM IRON COBALT ALLOYS - Thin Films;
D O I：
10.1063/1.336866
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The thermal stability of sputtered TbFeCo thin films in magneto-optic quadrilayer structures containing Si//3N//4, SiO, and SiO//2 dielectrics has been examined. The observed changes in coercivity upon annealing are attributed to two parallel mechanisms: structural relaxation in the amorphous magnetic alloy and preferential oxidation of Tb at the TbFeCo/SiO and TbFeCo/SiO//2 interfaces. Kinetic modeling has revealed that a spectrum of activation energies is required to explain the relaxation data, whereas a single activation energy of 1. 65 eV describes the oxidation process.
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页码：213 / 217
页数：5
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