ELECTROSTATIC REFLEX PLASMA SOURCE AS A PLASMA BRIDGE NEUTRALIZER

被引:12
作者
LEJEUNE, C
GRANDCHAMP, JP
KESSI, O
机构
[1] CNRS, Orsay, Fr, CNRS, Orsay, Fr
关键词
ELECTROSTATICS - ION BEAMS;
D O I
10.1016/0042-207X(86)90126-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A new type of plasma source is described, to be used as a plasma bridge neutralizer (PBN) for space and current compensation of low energy ion beams. In contrast to existing hollow cathode PBN, the present design has a discharge which operates down to a low neutral pressure (1-5 multiplied by 10** minus **3 torr), so that the plasma jet now effuses through an aperture which may be quite large (5-12 mm), according to the beam current to be compensated. Two anodes are provided: one is located within the source chamber whereas the second is outside, near the plasma emission aperture. Thus two different coupling modes of the PBN are possible. Typical performance and lifetime are reported for the neutralization of reactive beams (O//2 or CF//4).
引用
收藏
页码:857 / 860
页数:4
相关论文
共 11 条
[1]   INTENSE ION-BEAMS [J].
GREEN, TS .
REPORTS ON PROGRESS IN PHYSICS, 1974, 37 (10) :1257-+
[2]   TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .2. APPLICATIONS [J].
HARPER, JME ;
CUOMO, JJ ;
KAUFMAN, HR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :737-756
[3]  
Kaufman H.R., 1974, ADV ELECT ELECT PHYS, V36, P265
[4]   TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY [J].
KAUFMAN, HR ;
CUOMO, JJ ;
HARPER, JME .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03) :725-736
[5]   SMALL, SIMPLE AND HIGH-EFFICIENCY ARSENIC ION-SOURCE [J].
LEJEUNE, C ;
GAUTHERIN, G .
VACUUM, 1984, 34 (1-2) :251-257
[6]   THEORETICAL AND EXPERIMENTAL STUDY OF DUOPLASMATRON ION-SOURCE .1. MODEL OF DUOPLASMATRON DISCHARGE [J].
LEJEUNE, C .
NUCLEAR INSTRUMENTS & METHODS, 1974, 116 (03) :417-428
[7]   THEORETICAL AND EXPERIMENTAL STUDY OF DUOPLASMATRON ION-SOURCE .2. EMISSIVE PROPERTIES OF SOURCE [J].
LEJEUNE, C .
NUCLEAR INSTRUMENTS & METHODS, 1974, 116 (03) :429-443
[8]   TRIPLASMATRON SOURCES FOR BROAD AND REACTIVE ION-BEAMS [J].
LEJEUNE, C ;
GRANDCHAMP, JP ;
KESSI, O ;
GILLES, JP .
VACUUM, 1986, 36 (11-12) :851-855
[9]  
LEJEUNE C, 1983, CR HEBD SEANC ACAD S, V296, P1391
[10]   ARGON PLASMA BRIDGE NEUTRALIZER OPERATION WITH A 10-CM-BEAM-DIAMETER ION ETCHING SOURCE [J].
READER, PD ;
WHITE, DP ;
ISAACSON, GC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :1093-1095