THE STATE OF CHEMISORPTION OF H2O ON SILICON SURFACES AT ROOM-TEMPERATURE

被引：52

作者：

OELLIG, EM

BUTZ, R

WAGNER, H

IBACH, H

机构：

来源：

SOLID STATE COMMUNICATIONS | 1984年 / 51卷 / 01期

关键词：

D O I：

10.1016/0038-1098(84)90759-2

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

收藏

页码：7 / 8

页数：2

相关论文

共 17 条

[1] H2O INTERACTION WITH CLEAN AND OXYGEN PRECOVERED NI(110)
BENNDORF, C
NOBL, C
RUSENBERG, M
THIEME, F
[J]. SURFACE SCIENCE, 1981, 111 (01) : 87 - 101
[2] THE VIBRATIONAL-SPECTRUM OF H2O ON SI(100)
BLACK, JE
BOPP, P
WOLFSBERG, M
[J]. SURFACE SCIENCE, 1983, 134 (01) : 257 - 271
[3] DEPARTURE FROM A STABLE SIH3 PHASE ON SI(111)
BUTZ, R
MEMEO, R
WAGNER, H
[J]. PHYSICAL REVIEW B, 1982, 25 (06): : 4327 - 4330
[4] BUTZ R, UNPUB
[5] Chabal Y. J., UNPUB
[6] DISSOCIATION OF WATER-MOLECULES ON SI SURFACES
CIRACI, S
WAGNER, H
[J]. PHYSICAL REVIEW B, 1983, 27 (08): : 5180 - 5183
[7] CIRACI S, PHYS REV B
[8] LOCALIZED BOND MODEL FOR H2O CHEMISORPTION ON SILICON SURFACES
FUJIWARA, K
[J]. SURFACE SCIENCE, 1981, 108 (01) : 124 - 134
[9] ELECTRON ORBITAL ENERGIES OF H2S AND H2O CHEMISORBED ON THE SI(111)7X7 SURFACE
FUJIWARA, K
[J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 75 (10) : 5172 - 5178
[10] VIBRATIONAL STUDY OF THE INITIAL-STAGES OF THE OXIDATION OF SI(111) AND SI(100) SURFACES
IBACH, H
BRUCHMANN, HD
WAGNER, H
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1982, 29 (03): : 113 - 124