A COMPARISON OF THE PROPERTIES OF HARD CARBON-FILMS PRODUCED BY DIRECT GAS DEPOSITION AND PLASMA-ASSISTED EVAPORATION

被引：11

作者：

DEHBIALAOUI, A ^{[1
]}

JAMES, AS ^{[1
]}

MATTHEWS, A ^{[1
]}

机构：

[1] UNIV HULL,DEPT ENGN DESIGN & MANUFACTURE,SURFACE ENGN RES CTR,HULL HU6 7RX,N HUMBERSIDE,ENGLAND

来源：

SURFACE & COATINGS TECHNOLOGY | 1990年 / 43-4卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(90)90063-I

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The mechanical and optical properties of carbon films grown using direct gas deposition from a fast atom beam source are compared with those of films grown by evaporation of graphite in butane and argon d.c. or low frequency r.f. plasmas. The characteristics are found to be highly dependent on the substrate material (glass or tool steel) and are also related to process conditions, such as bias voltage and hydrogen to carbon ratio in the plasma.

引用

页码：88 / 98

页数：11

共 7 条

[1] Angus J.C., 1986, PLASMA DEPOSITED THI, P89
[2] RF-PLASMA DEPOSITED AMORPHOUS HYDROGENATED HARD CARBON THIN-FILMS - PREPARATION, PROPERTIES, AND APPLICATIONS
BUBENZER, A
DISCHLER, B
BRANDT, G
KOIDL, P
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) : 4590 - 4595
[3] PREPARATION AND PROPERTIES OF DIAMONDLIKE CARBON-FILMS
FRANKS, J
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 2307 - 2310
[4] FRANKS J, 1981, Patent No. 1158782
[5] HAS Z, 1986, 1985 INT C DIAM CRYS, V7, P131
[6] TAUC J, 1973, AMORPHOUS SEMICONDUC
[7] GRAPHITE FORMATION IN DIAMOND FILM DEPOSITION
ZHU, W
RANDALL, CA
BADZIAN, AR
MESSIER, R
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 2315 - 2324

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