GIANT MAGNETORESISTANCE AND MICROSTRUCTURE IN HIGHLY ORIENTED CO/CU MULTILAYERS SPUTTER-DEPOSITED ON (111)SILICON

被引:6
作者
POLLARD, RJ [1 ]
WILSON, MJ [1 ]
GRUNDY, PJ [1 ]
机构
[1] UNIV SALFORD,DEPT PHYS,JOULE LAB,SALFORD M5 4WT,LANCS,ENGLAND
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1016/0304-8853(95)00388-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper reports the results of giant magnetoresistance (GMR) and magnetic hysteresis measurements on sputter-deposited Co/Cu multilayers with random or highly oriented (111) textures. These results are correlated with microstructural information obtained by high-resolution transmission electron microscopy and by X-ray diffraction. The multilayers were designed to be at the second maximum of the oscillatory exchange coupling and were deposited onto ion beam etched (111) Si substrates. We find that randomly oriented multilayers exhibit clear antiferromagnetic coupling and similar to 20% GMR, whereas (111)-oriented multilayers are ferromagnetically coupled and show near-zero GMR.
引用
收藏
页码:139 / 144
页数:6
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