SOURCES OF CONDUCTION-BAND POLARIZATION IN DRIVING FORCE FOR ELECTROMIGRATION

被引：12

作者：

LANDAUER, R ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

THIN SOLID FILMS | 1975年 / 26卷 / 01期

关键词：

D O I：

10.1016/0040-6090(75)90178-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

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页码：L1 / L2

页数：2

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