PHOTOASSISTED CATALYTIC DISSOCIATION OF H2O TO PRODUCE HYDROGEN ON PARTIALLY REDUCED ALPHA-FE2O3

被引：39

作者：

KHADER, MM

VURENS, GH

KIM, IK

SALMERON, M

SOMORJAI, GA

机构：

[1] UNIV CALIF BERKELEY,DEPT CHEM,BERKELEY,CA 94720

[2] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,CTR ADV MAT,DIV MAT & MOLEC RES,BERKELEY,CA 94720

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1987年 / 109卷 / 12期

关键词：

D O I：

10.1021/ja00246a014

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：3581 / 3585

页数：5

共 25 条

[1] DIFFUSION CONTROLLED AND TRANSIENT PHOTOCURRENTS OF PHOTO-OXIDATION REACTIONS AT POLYCRYSTALLINE ALPHA-FE2O3
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (01) : 21 - 26
[2] PHOTO-ELECTROCHEMICAL HYDROGEN EVOLUTION AND WATER-PHOTOLYZING SEMICONDUCTOR SUSPENSIONS - PROPERTIES OF PLATINUM GROUP METAL CATALYST SEMICONDUCTOR CONTACTS IN AIR AND IN HYDROGEN
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HELLER, A
[J]. JOURNAL OF PHYSICAL CHEMISTRY, 1983, 87 (24) : 4919 - 4929
[3] DIFFERENT PHOTOELECTROCHEMICAL BEHAVIOR OF SINTERED AND FLAME-OXIDIZED FE2O3
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[4] A MECHANISM OF ELECTRON-HOLE PAIR SEPARATION IN ILLUMINATED SEMICONDUCTOR PARTICLES
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[J]. JOURNAL OF PHYSICAL CHEMISTRY, 1984, 88 (25) : 6096 - 6097
[5] SEMICONDUCTOR ELECTRODES .10. PHOTOELECTROCHEMICAL BEHAVIOR OF SEVERAL POLYCRYSTALLINE METAL-OXIDE ELECTRODES IN AQUEOUS-SOLUTIONS
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BARD, AJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (02) : 215 - 224
[6] SEMICONDUCTOR ELECTRODES .5. APPLICATION OF CHEMICALLY VAPOR-DEPOSITED IRON-OXIDE FILMS TO PHOTOSENSITIZED ELECTROLYSIS
HARDEE, KL
BARD, AJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (07) : 1024 - 1026
[7] CAPACITANCE VOLTAGE MEASUREMENTS AND FLAT-BAND POTENTIAL DETERMINATION ON ZR-DOPED ALPHA-FE2O3 SINGLE-CRYSTAL ELECTRODES
HOROWITZ, G
[J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1983, 159 (02) : 421 - 436
[8] THIN-FILM PHOTOELECTROCHEMISTRY - IRON-OXIDE
ITOH, K
BOCKRIS, JO
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (06) : 1266 - 1271
[9] FLATBAND POTENTIALS AND DONOR DENSITIES OF POLYCRYSTALLINE ALPHA-FE2O3 DETERMINED FROM MOTT-SCHOTTKY PLOTS
KENNEDY, JH
FRESE, KW
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (05) : 723 - 726
[10] ALPHA-FE2O3 PHOTOANODES DOPED WITH SILICON
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SHINAR, R
ZIEGLER, JP
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (10) : 2307 - 2309

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