BACKGROUND CALCULATION FOR X-RAY PHOTOELECTRON-SPECTRA ANALYSIS

被引：12

作者：

JOUAITI, A

MOSSER, A

ROMEO, M

SHINDO, S

机构：

[1] UNIV STRASBOURG 1,IPCMS,SURFACES INTERFACES GRP,UM 380046,4 RUE BLAISE PASCAL,F-67070 STRASBOURG,FRANCE

[2] TOKYO GAKUGEI UNIV,KOGANEI,TOKYO 184,JAPAN

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1992年 / 59卷 / 04期

关键词：

D O I：

10.1016/0368-2048(92)87012-B

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

We develop a fitting method for the background calculation of XPS spectra in order to determine the line shape and peak intensity of the primary emission. We compare the spectra theoretically and experimentally, using various methods based on the multiple inelastic scattering theory. We determine the inelastic background parameter, i.e. the ratio of the elastic peak area to the height of inelastic background, with which we compare the results of theoretical calculations. We investigate the contribution of surface excitations to the background formation using angle-resolved X-ray photoelectron spectra.

引用

页码：327 / 340

页数：14

共 17 条

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DONIACH S, 1970, J PHYS C SOLID STATE, V3, P291

[2] THE EFFECTS OF ELASTIC BACKSCATTERING ON THE AUGER OR X-RAY PHOTOELECTRON-SPECTRA OF SOLIDS [J].