Effect of sputtering geometry on (1120) textured ZnO piezofilm

被引：2

作者：

Miyamoto, Yoshinori ^{[1
]}

Yanagitani, Takahiko ^{[1
]}

Matsukawa, Mami ^{[1
]}

Watanabe, Yoshiaki ^{[1
]}

机构：

[1] Doshisha Univ, Fac Engn, 1-3 Miyakodani, Kyoto 6100321, Japan

来源：

ACOUSTICAL SCIENCE AND TECHNOLOGY | 2006年 / 27卷 / 01期

基金：

日本学术振兴会;

关键词：

Piezoelectric film; Sputtering; Crystallite alignment; Zinc oxide;

D O I：

10.1250/ast.27.53

中图分类号：

O42 [声学];

学科分类号：

070206 ; 082403 ;

摘要：

The effects of sputtering geometry on (112̄0) textured ZnO piezofilm were analyzed. The ZnO film was fabricated using a conventional RF magnetron sputtering apparatus. The crystallite alignment in the substrate normal direction was estimated using the full width half maximum (FWHM) of the ω-scan rocking curve. The results show that crystallites alignment and film thickness are strongly affected by the substrate position, despite that the other sputtering conditions are identical.

引用

页码：53 / 55

页数：3

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