THICKNESS DEPENDENCE OF THE IRREVERSIBILITY LINE IN YBA2CU3O7-X THIN-FILMS

被引：44

作者：

CIVALE, L

WORTHINGTON, TK

GUPTA, A

机构：

[1] IBM, Thomas J. Watson Research Center, Yorktown Heights

来源：

PHYSICAL REVIEW B | 1991年 / 43卷 / 07期

关键词：

D O I：

10.1103/PhysRevB.43.5425

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report a determination of the irreversibility line in the field-temperature plane of YBa2Cu3O7-x films measured by ac susceptibility. For films thicker than approximately 1000 angstrom, H(irr) is similar to that observed in single crystals even though the critical current in the films is orders of magnitude larger. However, for films thinner than 1000 angstrom, the irreversibility line is observed to shift to lower temperatures. This suppression is discussed in terms of various models for the irreversibility line.

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页码：5425 / 5429

页数：5

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