ON THE POOLE-FRENKEL CONSTANT

被引:1
作者
TOROK, MI
机构
来源
PHYSICA STATUS SOLIDI B-BASIC RESEARCH | 1984年 / 126卷 / 01期
关键词
D O I
10.1002/pssb.2221260170
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:K97 / K99
页数:3
相关论文
共 19 条
[1]  
ALTARELLI M, 1983, HDB SEMICONDUCTORS, P280
[2]   ANOMALOUS VALUE OF POOLE-FRENKEL COEFFICIENT [J].
BOON, MR .
THIN SOLID FILMS, 1971, 8 (01) :R5-&
[3]  
COITROU N, 1969, THIN SOLID FILMS, V3, P269
[4]   THEORY OF POOLE-FRENKEL CONDUCTION IN LOW-MOBILITY SEMICONDUCTORS [J].
CONNELL, GAN ;
CAMPHAUSEN, DL ;
PAUL, W .
PHILOSOPHICAL MAGAZINE, 1972, 26 (03) :541-+
[5]  
DEERY M, 1971, THIN SOLID FILMS, V8, pR16
[6]  
Frenkel J, 1938, PHYS REV, V54, P647, DOI 10.1103/PhysRev.54.647
[7]   POOLE-FRENKEL CONDUCTION MECHANISM IN AMORPHOUS GESE FILMS [J].
FRITZSCH, L ;
BOBE, W .
PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1973, 58 (01) :K49-K52
[8]   POOLE-FRENKEL EFFECT [J].
HALL, RB .
THIN SOLID FILMS, 1971, 8 (04) :263-&
[9]   NEGATIVE-U PROPERTIES FOR INTERSTITIAL BORON IN SILICON [J].
HARRIS, RD ;
NEWTON, JL ;
WATKINS, GD .
PHYSICAL REVIEW LETTERS, 1982, 48 (18) :1271-1274
[10]   POOLE-FRENKEL CONSTANT [J].
HILL, RM .
THIN SOLID FILMS, 1971, 8 (03) :R21-&