ELECTRON BEAMS - MICROSCOPIC EXAMINATION - Scanning Electron Microscopy;
D O I:
10.1088/0268-1242/2/4/005
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The electron-beam-induced-current technique (SEM/EBIC) is applied in silicon bicrystals in order to study both the bulk diffusion length and the grain boundary recombination velocity. Different methods of evaluation are applied and the results are compared. The effect of various parameters on the quantitative analysis is discussed, in particular (i) the observation conditions (accelerating voltage and injection level), (ii) the angle between the grain boundary and the top surface and (iii) variation of the minority carrier diffusion length.