PREPARATION AND PROPERTIES OF REACTIVELY SPUTTERED SILICON NITRIDE

[1] SILICON NITRIDE THIN FILM DIELECTRIC [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (02) : 98 - 100

[2] Collins J.F.., 1955, J MET, V7, P612, DOI DOI 10.1007/BF03377548

[3] MATERIALS AND PROCESSES FOR PASSIVE THIN-FILM COMPONENTS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1966, 3 (02): : 37 - &

[4] HU SM, 1965, OCT EL SOC M

[5] PLISKIN WA, 1965, J ELECTROCHEM SOC, V112, P1014

[6] TOOMBS NC, 1965, OCT INT EL DEV C

[7] Von Hippel A.R., 1959, DIELECTRICS WAVES

[1] SILICON NITRIDE THIN FILM DIELECTRIC [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (02) : 98 - 100

[2] Collins J.F.., 1955, J MET, V7, P612, DOI DOI 10.1007/BF03377548

[3] MATERIALS AND PROCESSES FOR PASSIVE THIN-FILM COMPONENTS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1966, 3 (02): : 37 - &

[4] HU SM, 1965, OCT EL SOC M

[5] PLISKIN WA, 1965, J ELECTROCHEM SOC, V112, P1014

[6] TOOMBS NC, 1965, OCT INT EL DEV C

[7] Von Hippel A.R., 1959, DIELECTRICS WAVES