PROPOSED ABLATION LASER

被引：7

作者：

DREYFUS, RW ^{[1
]}

WALLACE, SC ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

OPTICS COMMUNICATIONS | 1975年 / 13卷 / 03期

关键词：

D O I：

10.1016/0030-4018(75)90084-X

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：218 / 221

页数：4

共 15 条

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[2] PHOTOGRAPHIC SENSITIVITY MEASUREMENTS IN VACUUM ULTRAVIOLET [J].

BURTON, WM ;

HATTER, AT ;

RIDGELEY, A .

APPLIED OPTICS, 1973, 12 (08) :1851-1857

[3] TEMPERATURE DEPENDENCE OF RARE-GAS MOLECULAR EMISSION IN VACUUM ULTRAVIOLET [J].

CHESHNOVSKY, O ;

JORTNER, J ;

RAZ, B .

CHEMICAL PHYSICS LETTERS, 1972, 15 (04) :475-+

[4]

COOK GA, 1961, ARGON HELIUM RARE GA, P26202

[5] MOLECULAR-HYDROGEN LASER - 1098-1613 A [J].

DREYFUS, RW ;

HODGSON, RT .

PHYSICAL REVIEW A, 1974, 9 (06) :2635-2648

[6] RELATIVISTIC ELECTRON-BEAM PUMPED UV GAS-LASERS [J].

DREYFUS, RW ;

HODGSON, RT .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06) :1033-1036

[7]

GERARDO JB, 1973, IEEE J QUANT ELECTRO, V9, P719

[8]

GERARDO JB, UNPUBLISHED RESULTS

[9] OBSERVATIONS OF STIMULATED EMISSION FROM HIGH-PRESSURE KRYPTON AND ARGON-XENON MIXTURES [J].

HOFF, PW ;

SWINGLE, JC ;

RHODES, CK .

APPLIED PHYSICS LETTERS, 1973, 23 (05) :245-246

[10]

HOFF PW, 1973, 26 GAS EL C MAD

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