STRESS IN SPUTTERED TASIX FILMS ON POLYCRYSTALLINE SILICON

被引：9

作者：

DRAPER, BL

机构：

来源：

APPLIED PHYSICS LETTERS | 1984年 / 44卷 / 09期

关键词：

D O I：

10.1063/1.94959

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：863 / 865

页数：3

共 9 条

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