DIFFERENTIAL REPAIR OF UV DAMAGE IN RAD MUTANTS OF SACCHAROMYCES-CEREVISIAE - A POSSIBLE FUNCTION OF G-2 ARREST UPON UV IRRADIATION

被引：78

作者：

TERLETH, C ^{[1
]}

SCHENK, P ^{[1
]}

POOT, R ^{[1
]}

BROUWER, J ^{[1
]}

VANDEPUTTE, P ^{[1
]}

机构：

[1] LEIDEN STATE UNIV,GORLAEUS LABS,DEPT BIOCHEM,MOLEC GENET LAB,POB 9502,2300 RA LEIDEN,NETHERLANDS

来源：

MOLECULAR AND CELLULAR BIOLOGY | 1990年 / 10卷 / 09期

关键词：

D O I：

10.1128/MCB.10.9.4678

中图分类号：

Q5 [生物化学]; Q7 [分子生物学];

学科分类号：

071010 ; 081704 ;

摘要：

After UV irradiation, the transcriptionally active MATα locus in Saccharomyces cerevisiae is preferentially repaired compared with the inactive HMLα locus. The effect of rad mutations from three different epistasis groups on differential repair was investigated. Three mutants, rad9, rad16, and rad24, were impaired in the removal of UV dimers from the inactive HMLα locus, whereas they had generally normal repair of the active MATα locus. Since RAD9 is necessary for G2 arrest after UV irradiation, we propose that the G2 stage plays a role in making the dimers accessible for repair, at least in the repressed HMLα locus.

引用

页码：4678 / 4684

页数：7

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