MAGNETIC AND ELECTRONIC-PROPERTIES OF NI FILMS, SURFACES, AND INTERFACES

被引：178

作者：

TERSOFF, J

FALICOV, LM

机构：

[1] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,MAT & MOLEC RES LAB,BERKELEY,CA 94720

[2] UNIV CALIF BERKELEY,DEPT PHYS,BERKELEY,CA 94720

来源：

PHYSICAL REVIEW B | 1982年 / 26卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.26.6186

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：6186 / 6200

页数：15

共 29 条

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