LOW ENERGY ELECTRON DIFFRACTION STUDY OF FORMATION OF TAO(111)ONTA(110)

被引:10
作者
BOGGIO, JE
FARNSWORTH, HE
机构
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D O I
10.1016/0039-6028(65)90019-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
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页码:62 / +
页数:1
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共 7 条
[1]  
BOGGIO JE, IN PRESS
[2]  
FARNSWORTH HE, 1962, 9TH T AM VAC SOC 196, P68
[3]   The analysis of photoelectric sensitivity curves for clean metals at various temperatures [J].
Fowler, RH .
PHYSICAL REVIEW, 1931, 38 (01) :45-56
[4]   EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS [J].
GERSTENBERG, D ;
CALBICK, CJ .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) :402-&
[5]   AN X-RAY INVESTIGATION OF THE TANTALUM-OXYGEN SYSTEM [J].
SCHONBERG, N .
ACTA CHEMICA SCANDINAVICA, 1954, 8 (02) :240-245
[6]   THE OXIDATION OF TANTALUM AT 50-300-DEGREES-C [J].
VERMILYEA, DA .
ACTA METALLURGICA, 1958, 6 (03) :166-171
[7]  
WB, 2010, HDB IMP