CHARACTERIZATION OF BURIED THIN-FILMS WITH RESONANT SOFT-X-RAY FLUORESCENCE

被引：24

作者：

CARLISLE, JA

TERMINELLO, LJ

HUDSON, EA

PERERA, RCC

UNDERWOOD, JH

CALLCOTT, TA

JIA, JJ

EDERER, DL

HIMPSEL, FJ

SAMANT, MG

机构：

[1] UNIV CALIF BERKELEY,LAWRENCE BERKELEY LAB,BERKELEY,CA 94720

[2] UNIV TENNESSEE,KNOXVILLE,TN 37996

[3] TULANE UNIV,NEW ORLEANS,LA 70118

[4] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[5] IBM RES CORP,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

APPLIED PHYSICS LETTERS | 1995年 / 67卷 / 01期

关键词：

D O I：

10.1063/1.115483

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：34 / 36

页数：3

共 19 条

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[8] EPITAXIAL-GROWTH OF ZINC BLENDE AND WURTZITIC GALLIUM NITRIDE THIN-FILMS ON (001) SILICON
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[9] SOFT-X-RAY RESONANT INELASTIC-SCATTERING AT THE CK EDGE OF DIAMOND
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[10] BAND-STRUCTURE EFFECTS IN THE EXCITATION-ENERGY DEPENDENCE OF SI L2,3 X-RAY-EMISSION SPECTRA
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