PREPARATION AND OPTICAL-PROPERTIES OF PLASMA POLYMER SILVER COMPOSITE FILMS

被引:7
作者
HEILMANN, A
HAMANN, C
KAMPFRATH, G
HOPFE, V
机构
[1] University of Technology, Karl-Marx-Stadt, Department of Physics and Electronic Devices, Karl-Marx-Stadt 9010
关键词
D O I
10.1016/0042-207X(90)93994-T
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Plasma polymer silver composite films were prepared by simultaneous or alternating plasma polymerization and metal evaporation. The optical properties in uv, vis and nir were studied as functions of the filling factor by means of transmission spectra. Intensity and width of the plasma resonance absorption depend strongly on the microstructure of the films. Different effective mrdium theories were discussed in connection with the microstructure. The effective dielectric functions and the transmission spectra were calculated. The best results were obtained with the extension of the Maxwell-Garnett theory for parallel oriented elliptic particles. © 1990.
引用
收藏
页码:1472 / 1475
页数:4
相关论文
共 6 条
[1]  
Azzam R. M. A., 1977, ELLIPSOMETRY POLARIZ
[2]  
BNI C, 1989, NUCL INSTRUM METH B, P620
[3]   POROSITY OF MGF2 FILMS - EVALUATION BASED ON CHANGES IN REFRACTIVE INDEX DUE TO ADSORPTION OF VAPORS [J].
KINOSITA, K ;
NISHIBORI, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04) :730-+
[4]   OPTIMIZING DEPOSITION PARAMETERS OF ELECTRON-BEAM EVAPORATED TIO2 FILMS [J].
LEHMANN, HW ;
FRICK, K .
APPLIED OPTICS, 1988, 27 (23) :4920-4924
[5]   ION-ASSISTED DEPOSITION OF OPTICAL THIN-FILMS - LOW-ENERGY VS HIGH-ENERGY BOMBARDMENT [J].
MCNEIL, JR ;
BARRON, AC ;
WILSON, SR ;
HERRMANN, WC .
APPLIED OPTICS, 1984, 23 (04) :552-559
[6]   DETERMINATION OF THE THICKNESS AND OPTICAL-CONSTANTS OF AMORPHOUS-SILICON [J].
SWANEPOEL, R .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1983, 16 (12) :1214-1222