XENON HEXAFLUORIDE - PREPARATION OF PURE FORM + MELTING POINT

被引：28

作者：

SHEFT, I

SPITTLER, TM

MARTIN, FH

机构：

来源：

SCIENCE | 1964年 / 145卷 / 363期

关键词：

D O I：

10.1126/science.145.3633.701

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

引用

页码：701 / &

共 8 条

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SELIG, H ;

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[2]

CLAASSEN HH, 1963, NOBLE GAS COMPOUNDS, P287

[3] XENON HEXAFLUORIDE [J].

DUDLEY, FB ;

GARD, G ;

CADY, GH .

INORGANIC CHEMISTRY, 1963, 2 (01) :228-&

[4]

HYMAN HH, 1963, NOBLE GAS COMPOUN ED, P287

[5] XENON HEXAFLUORIDE [J].

MALM, JG ;

WEINSTOCK, B ;

SHEFT, I ;

CHERNICK, CL ;

WEAVER, EE ;

KNOP, CP .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1963, 85 (01) :110-&

[6]

SMITH DF, 1963, NOBLE GAS COMPOUNDS, P295

[7]

Weaver E.E., 1963, J AM CHEM SOC, V85, P111

[8] PHOTOCHEMICAL PREPARATION OF XENON DIFLUORIDE [J].

WEEKS, JL ;

CHERNICK, CL ;

MATHESON, MS .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1962, 84 (23) :4612-&

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