INSITU GROWTH OF HIGH-TC YBA2CU3O7-X FILMS AT HIGH DEPOSITION RATE BY LOW-PRESSURE MOCVD

被引：7

作者：

TAO, W ^{[1
]}

QIAN, CT ^{[1
]}

YE, CQ ^{[1
]}

机构：

[1] ACAD SINICA,SHANGHAI INST ORGAN CHEM,SHANGHAI 200032,PEOPLES R CHINA

来源：

MATERIALS LETTERS | 1992年 / 14卷 / 5-6期

关键词：

D O I：

10.1016/0167-577X(92)90031-E

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new technique for metalorganic chemical vapor deposition (MOCVD) using a very low deposition pressure (less-than-or-equal-to 1 Torr) has been developed for rapid deposition of superconducting YBa2Cu3O7-x (YBCO) films. A low deposition pressure not only raises the vaporization rate of organic sources but also stabilizes their sublimation characteristics, especially to Ba(thd)2. At a substrate temperature of 800-degrees-C, a high growth rate of 20-mu-m/h can be obtained on ( 100) SrTiO3 substrates. The transport J(c) (0 T, 77 K) values of these 1-2-mu-m thick films reached 8.0 X 10(5) A/cm2 with T(c,0)>90 K.

引用

页码：255 / 258

页数：4

共 15 条

[1]

BESMANN TM, 1988, MRS BULL, P45

[2] CHEMICAL VAPOR-DEPOSITION OF YBA2CU3O7-X SUPERCONDUCTING FILMS [J].

DICKINSON, PH ;

GEBALLE, TH ;

SANJURJO, A ;

HILDENBRAND, D ;

CRAIG, G ;

ZISK, M ;

COLLMAN, J ;

BANNING, SA ;

SIEVERS, RE .

JOURNAL OF APPLIED PHYSICS, 1989, 66 (01) :444-447

[3]

DICKINSON PH, 1989, J APPL PHYS, V29, pL947

[4] CORRELATION BETWEEN THE INSITU GROWTH-CONDITIONS OF YBCO THIN-FILMS AND THE THERMODYNAMIC STABILITY-CRITERIA [J].

HAMMOND, RH ;

BORMANN, R .

PHYSICA C, 1989, 162 :703-704

[5]

HAUSSLER P, 1991, APPL PHYS LETT, V59, P869

[6] RAPID CHEMICAL VAPOR-DEPOSITION OF SUPERCONDUCTING YBA2CU3OX [J].

LACKEY, WJ ;

CARTER, WB ;

HANIGOFSKY, JA ;

HILL, DN ;

BAREFIELD, EK ;

NEUMEIER, G ;

OBRIEN, DF ;

SHAPIRO, MJ ;

THOMPSON, JR ;

GREEN, AJ ;

MOSS, TS ;

JAKE, RA ;

EFFERSON, KR .

APPLIED PHYSICS LETTERS, 1990, 56 (12) :1175-1177

[7]

LIU YQ, 1991, APPL PHYS LETT, V58, P648

[8] Y-BA-CU-O SUPERCONDUCTING FILMS WITH HIGH-JC VALUES BY MOCVD USING BA-ADDITION PRODUCTS [J].

MATSUNO, S ;

UCHIKAWA, F ;

YOSHIZAKI, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1990, 29 (06) :L947-L948

[9] METALORGANIC CHEMICAL VAPOR-DEPOSITION OF SUPERCONDUCTING YBA2CU3O7-X IN A HIGH-SPEED ROTATING-DISK REACTOR [J].

NOH, DW ;

GALLOIS, B ;

CHERN, CS ;

CARACCIOLO, R ;

KEAR, BH ;

ZAWADZKI, PA ;

TOMPA, GS ;

NORRIS, PE .

JOURNAL OF APPLIED PHYSICS, 1989, 66 (10) :5099-5101

[10] Y-BA-CU-O FILM GROWTH BY OMCVD USING N2O [J].

TSURUOKA, T ;

KAWASAKI, R ;

ABE, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (10) :L1800-L1802

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