IMPROVING RESOLUTION IN PHOTOLITHOGRAPHY WITH A PHASE-SHIFTING MASK

被引：660

作者：

LEVENSON, MD

VISWANATHAN, NS

SIMPSON, RA

机构：

[1] IBM CORP,DIV GEN PROD,SAN JOSE,CA 95193

[2] IBM CORP,DIV SYST PROD,HOPEWELL JUNCTION,NY 12533

来源：

关键词：

D O I：

10.1109/T-ED.1982.21037

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1828 / 1836

页数：9

共 10 条

[1]

Born M., 1975, PRINCIPLES OPTICS, P370

[2]

BORN MJ, PRINCIPLES OPTICS, P128

[3]

BOUWKAMP CJ, 1954, REPT PROGR PHYS, V17, P39

[4]

CUTHBERT JD, 1977, SOLID STATE TECHNOL, V20, P59

[5]

GOODMAN D, 1979, THESIS U ARIZONA

[6]

GOODMAN JW, 1968, INTRO FOURIER OPTICS, P128

LIN, BJ .

[8]

LIN BJ, 1980, FINE LINE LITHOGRAPH, P107

[9]

THOMAS GRM, 1979, SPIE P, V174, P15

[10]

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