STOICHIOMETRY OF NIOXHY FILMS DETERMINED BY ION-BEAM ANALYSIS

被引：5

作者：

WAGNER, W ^{[1
]}

RAUCH, F ^{[1
]}

BANGE, K ^{[1
]}

机构：

[1] SCHOTT GLASWERKE,RES & DEV,D-55127 MAINZ,GERMANY

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1994年 / 89卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(94)95155-1

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The stoichiometry of nickel hydroxide films for electrochromical applications has been determined by means of the N-15 technique and RBS. Films with different properties were produced by evaporation with various deposition parameters and by anodic oxidation. Strong hydrogen effusion occurs during 15 N analysis, with a threshold below 10(12) ions cm-2. To obtain accurate hydrogen concentration values, different means for reducing hydrogen effusion have been tested. H/Ni ratios in the range 0.2 to 0.6 are found, in dependence on the deposition parameters. The O/Ni ratio is approximately 1.3. The H/Ni ratios are interpreted in the framework of a model for nickel hydroxide films. Strong correlations are found between film stoichiometry, density and refractive index. The films show radiochromic behaviour turning from transparent to brown color under ion-beam irradiation.

引用

页码：104 / 108

页数：5

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