POLYSILOXANE FORMATION FROM A TETRAETHOXYSILANE ETHYL-ALCOHOL OXALIC-ACID SYSTEM

被引：9

作者：

SUGAHARA, Y

SATO, S

KURODA, K

KATO, C

机构：

[1] Department of Applied Chemistry, School of Science and Engineering, Waseda University, Shinjuku-ku, Tokyo, 169

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1992年 / 147卷

关键词：

D O I：

10.1016/S0022-3093(05)80587-3

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by Si-29 nuclear magnetic resonance spectroscopy (Si-29-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)3SiOSi(OEt)3, (EtO)3SiOSi(OEt)2OSi(OEt)3, and (EtO)3Si(OSi(OEt)2)2OSi(OEt)3 Were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.

引用

页码：24 / 29

页数：6

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