OBSERVATION OF ION BOMBARDMENT DAMAGE IN SILICON

被引:148
作者
MAZEY, DJ
NELSON, RS
BARNES, RS
机构
来源
PHILOSOPHICAL MAGAZINE | 1968年 / 17卷 / 150期
关键词
D O I
10.1080/14786436808223192
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:1145 / &
相关论文
共 17 条
[1]  
GIANOLA UF, 1958, J APPL PHYS, V28, P868
[2]  
GUNNERSON EM, 1967, P C APPLICATIONS ION
[3]   ON THE STRUCTURE AND PROPERTIES OF SOME METAL AND METAL OXIDE FILMS [J].
HASS, G ;
SCOTT, NW .
JOURNAL DE PHYSIQUE ET LE RADIUM, 1950, 11 (07) :394-402
[4]  
LINDHARD J, 1963, MATH FYS MEDDR, V33
[5]  
MANCHESTER KE, 1966, SCP SOLID STATE TECH, P48
[6]  
MAZEY DJ, 1966, INT C ELECTRON MICRO, P363
[7]  
MCCALDIN JO, 1965, NUCLEAR INSTRUMENTS, P38
[8]  
MCCALDIN JO, 1965, PROGRESS SOLID STATE, V2, pCH2
[9]  
NELSON R, IN PRESS
[10]   The Influence of Channelling on Radiation Damage Produced in Silicon during Ion Bombardment [J].
Nelson, R. S. ;
Mazey, D. J. .
JOURNAL OF MATERIALS SCIENCE, 1967, 2 (03) :211-216