OBSERVATION OF HYDROGENATED AMORPHOUS-CARBON FILMS BY ATOMIC-FORCE MICROSCOPY

被引：6

作者：

NAKAMURA, Y

WATANABE, Y

SUEFUJI, Y

HIRAYAMA, S

机构：

[1] Department of Materials Science and Engineering, National Defense Academy, Yokosuka, Kanagawa

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1994年 / 77卷 / 05期

关键词：

D O I：

10.1111/j.1151-2916.1994.tb05423.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Atomic force microscopy images were made of the surface of CVD hydrogenated amorphous carbon films. The films were deposited from toluene vapor with oxygen additions during deposition, producing very smooth surfaces. Average roughnesses of only 0.5 nm were measured for the films made with oxygen, whereas a surface roughness of 11 nm was obtained for the films deposited without oxygen. The results suggest that sp2- and sp3-bonded carbons were removed by oxygen erosion for CVD hydrogenated amorphous carbon films deposited in the presence of oxygen.

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页码：1385 / 1387

页数：3

相关论文

共 17 条

[1] ATOMIC FORCE MICROSCOPE [J].

BINNIG, G ;

QUATE, CF ;

GERBER, C .

PHYSICAL REVIEW LETTERS, 1986, 56 (09) :930-933

[2] RF-PLASMA DEPOSITED AMORPHOUS HYDROGENATED HARD CARBON THIN-FILMS - PREPARATION, PROPERTIES, AND APPLICATIONS [J].

BUBENZER, A ;

DISCHLER, B ;

BRANDT, G ;

KOIDL, P .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) :4590-4595

[3] DIAMOND CRYSTAL-GROWTH BY PLASMA CHEMICAL VAPOR-DEPOSITION [J].

CHANG, CP ;

FLAMM, DL ;

IBBOTSON, DE ;

MUCHA, JA .

JOURNAL OF APPLIED PHYSICS, 1988, 63 (05) :1744-1748

[4]

CHESTERS S, 1991, SOLID STATE TECHNOL, V34, P73

[5] USE OF RAMAN-SCATTERING TO INVESTIGATE DISORDER AND CRYSTALLITE FORMATION IN AS-DEPOSITED AND ANNEALED CARBON-FILMS [J].

DILLON, RO ;

WOOLLAM, JA ;

KATKANANT, V .

PHYSICAL REVIEW B, 1984, 29 (06) :3482-3489

[6] TUNNELING MICROSCOPY ON VARIOUS CARBON MATERIALS [J].

ELINGS, V ;

WUDL, F .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (02) :412-414

[7] TEMPERATURE AND REACTIVE ETCHING EFFECTS ON THE MICROSTRUCTURE OF MICROWAVE PLASMA DEPOSITED DIAMOND FILMS [J].

HARKER, AB ;

DENATALE, JF .

JOURNAL OF MATERIALS RESEARCH, 1990, 5 (04) :818-823

[8]

HATA C, 1988, 1ST INT C NEW DIAM S

[9] EROSION OF DIAMOND FILMS AND GRAPHITE IN OXYGEN PLASMA [J].

JOSHI, A ;

NIMMAGADDA, R .

JOURNAL OF MATERIALS RESEARCH, 1991, 6 (07) :1484-1490

[10] EFFECTS OF OXYGEN ON CVD DIAMOND SYNTHESIS [J].

KAWATO, T ;

KONDO, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (09) :1429-1432