AMORPHIC DIAMOND FILMS PRODUCED BY A LASER PLASMA SOURCE

Recently, attention has been focused upon laser plasma sources of thin-film diamond. These depend upon laser-ignited discharges in which intense pulsed currents flow through the small volume of carbon plasma ablated from graphite feedstock by a focused laser beam. The materials produced in this way generally resemble the hard amorphic films deposited by ion beams. This paper reports a detailed characterization of these films which we call amorphic diamond. The combination of an optical band gap of 1.0 eV with a grain size of 100-200 Å places this material far outside the range of possibilities available to the model of graphitic islands. A structure of very fine grained diamond would more readily explain the hardness of 13 GPa determined in the absence of any measurable fraction of hydrogen. Such amorphic diamond films have been grown uniformly on 100-cm2 areas at ambient room temperatures with no seeding or abrasion of the substrate.