THRESHOLD OSCILLATION OF AN NF(A(1)DELTA)/BIF VISIBLE WAVELENGTH CHEMICAL-LASER

被引：27

作者：

BENARD, DJ

机构：

[1] Rockwell International Science Center, Thousand Oaks

来源：

JOURNAL OF APPLIED PHYSICS | 1993年 / 74卷 / 04期

关键词：

D O I：

10.1063/1.354645

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A novel shock tube reactor was used to pulse heat a gaseous mixture of He, FN3, and Bi(CH3)3 along a 40 cm optical path between two highly reflective mirrors. Production of NF(a1DELTA) by dissociation of the azide was found to occur in a ''delayed avalanche'' approximately 50 mus after shock reflection, and weak lasing at 470 nm was observed that is assignable to electronic transitions in the BiF(A-X, DELTAv=3) band.

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页码：2900 / 2907

页数：8

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