SHEATH AND HEAT-FLOW OF A 2-ELECTRON-TEMPERATURE PLASMA IN THE PRESENCE OF ELECTRON-EMISSION

被引:3
作者
SATO, K
MIYAWAKI, F
机构
[1] Department of Electrical Engineering, Himeji Institute of Technology
关键词
SECONDARY ELECTRON EMISSION; PLASMA SHEATH; HEAT FLOW; 2-ELECTRON-TEMPERATURE PLASMA; SPACE-CHARGE LIMITATION;
D O I
10.1143/JPSJ.61.1453
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The electrostatic sheath and the heat flow of a two-electron-temperature plasma in the presence of electron emission are investigated analytically. It is shown that the energy flux is markedly enhanced to a value near the electron free-flow energy flux as a result of considerable reduction of the sheath potential due to electron emission if the fraction of hot electrons at the sheath edge is much smaller than one. If the hot- to cold-electron temperature ratio is of the order of ten and the hot electron density is comparable to the cold electron density, the action of the sheath as a thermal insulator is improved as a result of suppression of electron emission due to the space-charge effect of hot electrons.
引用
收藏
页码:1453 / 1456
页数:4
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