2-WAY PHOTOCURRENT-MULTIPLICATION IN AMORPHOUS-SILICON CARBIDE CELLS

被引:4
作者
NAKAYAMA, Y
YAJIMA, T
UEDA, H
AKITA, S
KAWAMURA, T
机构
[1] Electrical Engineering, College of Engineering, University of Osaka Prefecture, Sakai, Osaka, 591, Mozu Umemachi
关键词
D O I
10.1016/S0022-3093(05)80357-6
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A photocurrent multiplication for both polarities of an applied electric field (two-way) has been demonstrated in simple amorphous silicon carbide (a-SiC:H) cells of SnO2/a-SiC:H/Au. A model of the electron tunneling through the Schottky barriers formed at the interfaces of SnO2/a-SiC:H and Au/a-SiC:H has been proposed as a mechanism of the photocurrent multiplication. This is consistent with the dependence of the cell properties on the phosphorus doping to a-SiC:H films and on other parameters of light wavelength and temperature.
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页码:1279 / 1282
页数:4
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