SYNTHESIS OF DIAMOND THIN-FILMS BY THERMAL CVD USING ORGANIC-COMPOUNDS

Diamond thin films have been formed by thermal chemical vapor deposition (thermal VCD) using the organic compounds such as CH//3OH, C//2H//5OH, CH//3COCH//3, C//2H//5OC//2H//5 and (CH//3)//3N. The films are grown on the silicon substrates with high growth rate (8-10 mu m/h) under the pressure ranging 1-800 Torr. This growth rate is ten or several ten times faster than the CVD method using hydrocarbons such as CH//4 and C//2 and C//2H//2. The films have good crystallinity and high quality in the sense of electron diffraction and Raman spectrum. The Vicker's hardness of the film is about 10,000 kg/mm**2 and the gravity of that is about 3. 25 g/cm**3.