DETERMINATION OF FILM STRESSES DURING SPUTTER DEPOSITION USING AN INSITU PROBE

被引：15

作者：

HOFFMAN, DW

KUKLA, CM

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572842

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2600 / 2604

页数：5

共 28 条

[1]

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[2]

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[4]

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[8] COMPRESSIVE STRESS TRANSITION IN AL, V, ZR, NB AND W METAL-FILMS SPUTTERED AT LOW WORKING PRESSURES [J].

HOFFMAN, DW ;

THORNTON, JA .

THIN SOLID FILMS, 1977, 45 (02) :387-396

[9] INTERNAL-STRESSES IN CR, MO, TA, AND PT FILMS DEPOSITED BY SPUTTERING FROM A PLANAR MAGNETRON SOURCE [J].

HOFFMAN, DW ;

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :355-358

[10] STRESS AND PROPERTY CONTROL IN SPUTTERED METAL-FILMS WITHOUT SUBSTRATE BIAS [J].

HOFFMAN, DW .

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