AMORPHOUS DIAMOND-LIKE CARBON-FILMS - EFFECT OF DEPOSITION RATE ON OPTICAL AND MECHANICAL-PROPERTIES

被引：7

作者：

MACKOWSKI, JM

PIGNARD, R

VEDOVOTTO, N

ROBERT, P

DONNADIEU, A

机构：

[1] SOC ANONYME TELECOMMUN,F-75013 PARIS,FRANCE

[2] UNIV MONTPELLIER 2,F-34060 MONTPELLIER,FRANCE

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1985年 / 77-8卷

关键词：

D O I：

10.1016/0022-3093(85)90790-2

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

6

引用

收藏

页码：837 / 840

页数：4

相关论文

共 6 条

[1] BENDOW BB, 1982, APR P DARPA WORKSH D
[2] OPTICAL GAP AND INDEX OF REFRACTION OF HYDROGENATED FILMS OF AMORPHOUS-SILICON AT 95-DEGREES-K AND 295-DEGREES-K
FERRATON, JP
ANCE, C
DONNADIEU, A
[J]. THIN SOLID FILMS, 1981, 78 (03) : 207 - 215
[3] MACKOWSKI JM, 1982, VIDE S, V212, P99
[4] The tension of metallic films deposited by electrolysis
Stoney, GG
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-CONTAINING PAPERS OF A MATHEMATICAL AND PHYSICAL CHARACTER, 1909, 82 (553) : 172 - 175
[5] TOUZE Y, 1984, VIDE, V223, P323
[6] BEHAVIOR OF ELECTRONIC DIELECTRIC CONSTANT IN COVALENT AND IONIC MATERIALS
WEMPLE, SH
DIDOMENI.M
[J]. PHYSICAL REVIEW B, 1971, 3 (04): : 1338 - &