LATTICE POSITIONS OF IMPLANTED IONS IN SILICON-CRYSTALS

被引:12
作者
FRERICHS, HP
KALBITZER, S
机构
来源
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1984年 / 83卷 / 1-2期
关键词
D O I
10.1080/00337578408215797
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
引用
收藏
页码:135 / 143
页数:9
相关论文
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[6]  
KALBITZER S, 1976, 4TH P C SCI IND APPL, P403
[7]  
Mayer J. W., 1970, ION IMPLANTATION SEM
[8]   ION IMPLANTATION OF SILICON AND GERMANIUM AT ROOM TEMPERATURE . ANALYSIS BY MEANS OF 1.0-MEV HELIUM ION SCATTERING [J].
MAYER, JW ;
ERIKSSON, L ;
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DAVIES, JA .
CANADIAN JOURNAL OF PHYSICS, 1968, 46 (06) :663-&
[9]  
OETZMANN H, 1978, RAD EFF, V47, P57
[10]  
POATE JM, 1975, ION IMPLANTATION SEM, P361