PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF ZRF4-BASED FLUORIDE GLASSES

被引：4

作者：

FUJIURA, K

NISHIDA, Y

SATO, H

SUGAWARA, S

KOBAYASHI, K

TERUNUMA, Y

TAKAHASHI, S

机构：

[1] NTT Opto-Electronics Laboratories, Tokai, Ibaraki

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1993年 / 161卷

关键词：

Fluorine - Vapor deposition - Zirconium compounds;

D O I：

10.1016/0022-3093(93)90660-P

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A ZBLAN (ZrF4-BaF2-LaF3-AlF3-NaF) glass film is synthesized for the first time on the inner surface of a ZBLYAN (ZrF4-BaF2-LaF3-YF3-AlF3-NaF) support tube. The maximum deposition rate is about 60 mum/h. The composition of the ZBLAN-glass film is controlled with the vaporizing temperatures of the starting materials, but compositional distribution is observed along the preform axis. The thermal properties of the synthesized glass film are nearly the same as those of ZBLAN glass synthesized by the conventional melt-casting method.

引用

页码：14 / 17

页数：4

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